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AI 芯片Semiconductor Digest

Applied Materials, Intel Deepen R&D Collaboration on Transistor Scaling and Advanced Packaging

发布方: Semiconductor Digest发布时间: 2026年10月06日 18:29

资讯摘要

The collaboration will bring together cutting-edge capabilities from Applied’s EPIC Center in Silicon Valley and Intel’s R&D campus in Hillsboro, Oregon to shorten time-to-market of advanced semiconductor technologies essential to AI computing. The post Applied Materials, Intel Deepen R&D Collaboration on Transistor Scaling and Advanced Packaging appeared first on Semiconductor Digest .

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